Gdentallab
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i hope i'm not out of subject,
the invex liquid is at 1% HF, the etching is done at 9 %. right ?
so practically it is safe to use a higher concentration of HF. why no augment the concentration of the invex liquid ? wouldn't that make it easier to romove the reaction layer?
the invex liquid is at 1% HF, the etching is done at 9 %. right ?
so practically it is safe to use a higher concentration of HF. why no augment the concentration of the invex liquid ? wouldn't that make it easier to romove the reaction layer?